1)TiN filmTiN薄膜
1.Influence of shield on properties of TiN films prepared by arc ion plating;挡板对电弧离子镀TiN薄膜性能的影响
2.Application of Oxidation Processing in TiN films Deposited by Vacuum Arc——A Practice of Combining Professional Courses with Science Program;氧化工艺在真空电弧沉积TiN薄膜中的应用——专业课程与课题相结合的实践
3.In the study, the authors prepare a layer of TiN film on carbide matrix by using hot cathode ion plating techniques.利用热阴极离子镀技术改变主弧电流,控制镀膜时间等参数,在硬质合金基体上制备了TiN薄膜;利用XRD、自动划痕仪、SEM和显微硬度计对所制备的样品进行了结构分析和性能检测。
英文短句/例句
1.The Research on TiN Films Deposited by Magnetron Sputtering;反应磁控溅射法制备TiN薄膜的研究
2.Study on the Tribological Properties of TiN Thin Films with Different Thicknesses不同厚度TiN薄膜摩擦学性能研究
3.The influence of TiN thin flms grown processing by magnetron sputtering磁控溅射制备TiN薄膜影响因素的研究
4.Research on Mo+C Implantation into TiN Film by Multi-arc Ion PlatingMo+C离子注入多弧离子镀TiN薄膜研究
5.Study of MOCVD TiN in Advanced Semiconductor Manufacturing;MOCVD TiN薄膜在先进集成电路制造中应用的研究
6.Preparation and Characteristic of TiN Film Prepared by Arc Ion Plating;电弧离子镀TiN薄膜的制备及其特性研究
7.Optical Property of TiN Films Deposited by Magnetron Sputtering;TiN薄膜的磁控溅射法制备及其光学性能研究
8.A Study on Atmospheric Pressure Chemical Vapor Deposition of TiN Film and Its Kinetics;TiN薄膜常压化学气相沉积及动力学研究
9.Preparation and properties of TiN films on ZL109 aluminum alloy by multi-arc ion platingZL109铝合金表面多弧离子镀TiN薄膜的制备及性能
10.Tribological properties of TiN films under different testing conditions不同测试条件下TiN薄膜的摩擦学特性研究
11.Research Progress of Preparation Technology,Properties and Application Development of TiN Thin FilmTiN薄膜制备方法、性能及其应用的研究进展
12.Technological parameters and electrical property of TiN thin films grown processing by magnetron sputtering磁控溅射TiN薄膜的工艺及电学性能研究
13.Visible Light Photoelectrochemical Response of Nitrogen-Doped TiO_2 Thin Films Prepared by Anodic Oxidation of Titanium Nitride Films阳极氧化TiN薄膜制备N掺杂纳米TiO_2薄膜及其可见光活性
14.Electrical Characteristics and TiN Film Deposition of Plasma Assisted Magnetron Sputtering;外部等离子源辅助磁控溅射电特性及TiN薄膜制备研究
15.Surface morphology and properties of the hollow cathode ion-plating and multi-arc ion plated TiN film空心阴极与多弧离子镀TiN薄膜的表面形貌及性能
16.Scratching Test and Its Finite Element Simulation for Estimating Adhesion between TiN Film and Substrate评估TiN薄膜与基材结合的划痕试验及有限元模拟
17.Fabrication Process and Application of TiN-TiN/CrN-CrN FilmsTiN-TiN/CrN-CrN薄膜的制备及应用研究
18.Study on Properties of TiN and ZrN Films Deposited by Magnetron Sputtering;磁控溅射TiN及ZrN薄膜的特性研究
相关短句/例句
TiN filmsTiN薄膜
1.The influence of magnetron sputtering TiN films processing parameters on microhardness;磁控溅射TiN薄膜工艺参数对显微硬度的影响
2.Preparation and properties of TiN films on ZL109 aluminum alloy by multi-arc ion platingZL109铝合金表面多弧离子镀TiN薄膜的制备及性能
3.Tribological properties of TiN films under different testing conditions不同测试条件下TiN薄膜的摩擦学特性研究
3)TiN thin filmsTiN薄膜
1.Effect of curved magnetic filtering on quality of TiN thin films prepared by the AIP technique;用弯曲磁过滤提高弧离子镀TiN薄膜质量
2.Technological parameters and electrical property of TiN thin films grown processing by magnetron sputtering磁控溅射TiN薄膜的工艺及电学性能研究
3.On the basis of experiments and theory analysis,TiN thin films can be obtained by CVD deposition on tool steel or mould steel substrates.在实验和理论分析的基础上,利用化学气相沉积技术在工具钢和模具钢基体表面沉积TiN薄膜,以提高模具表面强度和耐磨性。
4)TiN thin filmTiN薄膜
1.The nanohardness,adhesion strength to substrate,friction coefficients and tribological properties of the TiN thin films were studied.用中频磁控溅射镀膜机制备得到了各种厚度不同的TiN薄膜,研究了TiN薄膜的纳米硬度、膜基结合力、摩擦系数以及综合摩擦磨损性能。
2.The preparation technology and development of TiN thin film were reviewed.综述了TiN薄膜的制备方法及进展,介绍了物理气相沉积、化学气相沉积、等离子化学气相沉积及光化学气相沉积等各种TiN薄膜的制备方法,评述了各种制备工艺的优缺点。
5)TiN coatingTiN薄膜
1.The cavitation erosion process and mechanism were analyzed, and the influence of the hardness and thickness of the TiN coating on the cavitation-erosion performance was explored.采用自制磁致伸缩式空蚀磨损试验机考察了冷阴极离子镀TiN薄膜的空蚀磨损性能,分析了TiN镀层的空蚀磨损过程及机理,探讨了TiN镀层硬度和厚度对其空蚀磨损性能的影响。
2.For thinner TiN coating,micro-pits become larger and some of micro-pits connect with each other,while fatigue micro-cracks generat.采用物理气相沉积工艺在高速钢表面沉积TiN薄膜,研究了TiN薄膜的疲劳磨损过程。
6)TiN/AIN thin filmTiN/AlN薄膜
延伸阅读
tin chloride 又名四氯化锡，化学式SnCl4，分子量260.53。无色发烟液体，呈碱性，溶于水并放出大量热，其稀水溶液因水解而产生锡酸沉淀。能与醇、二硫化碳和松节油任意混溶。对氯气的吸收量很大。密度2.23g/cm3，熔点-33℃，沸点114℃，有腐蚀性，有毒。用于有机锡制备。有机分析中用以皂化酚和醚，由铷和钯中分离钾。其水合物为SnCl4·5H2O，白色或浅黄色固体，吸湿性强，易溶于水。用于有机合成、媒染剂、电子工业由锡跟干燥氯反应制得。
