1)Electrochemical etching电化学刻蚀
1.The Study of Porous InP Formed by Electrochemical Etching;电化学刻蚀方法制备多孔InP研究
2.Then the electrochemical etching experiments are done in three electrodes electrobath .对湿法刻蚀和电化学刻蚀中的工艺问题进行了初步的理论和实验研究,同时,采用SEM对实验样品进行了形貌分析,并采用电流突破模型对电化学深孔刻蚀机理进行了理论分析。
3.In order to solve the difficulties in producing and welding tiny bridge-belt,twn methods- producing by electrochemical etching and laser welding with powder cladding were put forward.针对微型桥带的成型与焊接工艺难题,提出了采用电化学刻蚀成型和利用粉末熔覆工艺进行激光焊接的工艺方法,并给出了具体的工艺过程,成功地实现了低成本、高质量、成批量的工业生产要求。
英文短句/例句
1.Circulating device is needed in electrochemical etching course.在电化学刻蚀过程中,需增加循环装置。
2.Study on High-resolution Electrochemical Etching of Metal Surface with Scanning Tunneling Microscope;STM金属表面高分辨电化学刻蚀的研究
3.The Study of Porous InP Formed by Electrochemical Etching;电化学刻蚀方法制备多孔InP研究
4.The Study of Porous InP Formation by Electrochemical Etching and Related Mechanism;电化学刻蚀制备多孔InP及机理研究
5.808nm Laser-Induced Electrochemical Etching808nm激光诱导电化学刻蚀研究
6.The study of the voltage effect on laser-induced electrochemical etching of silicon外加电压对激光电化学刻蚀硅的影响研究
7.Experimental Study on Excimer Laser Electrochemical Etching Process of Silicon;准分子激光电化学刻蚀硅工艺实验研究
8.Study of Porous InP Arrays Formed by Electrochemical Etching;电化学刻蚀半导体InP纳米多孔阵列及机理研究
9.Large Size P-type Silicon Microchannel Plates Prepared by Photo-Electrochemical Etching由光辅助电化学刻蚀制备大面积p型硅微通道板
10.Enhanced Photoelectrochemical Performance of WO_3 Film Electrode under Visible Light by Electrochemical Etching Fluorination in Aqueous Solutions Containing Fluorine含氟水溶液中电化学刻蚀氟化WO_3薄膜电极增强可见光光电化学性能
11.Investigation of Electro Chemical Deep Etching Technology for Micro-nano-Electro-Mechanical System Device Fabrication;应用于微纳机电器件制造的电化学深刻蚀技术
12.A STUDY OF THE PROPERTIES OF ECE RECOIL TRACKS INDUCED BY FAST NEUTRON IN POLYCARBONATE FOILS聚碳酸酯快中子反冲径迹的电化学蚀刻研究
13.Mechanism Analysis of the Pulsed Electrochemical Machining(PECM),Polishing(EP) and Micromachining(EMM) Based on a Capacity Model基于电容模型的脉冲电解、电化学光整、蚀刻加工机理分析
14.gas discharge etching气体放电蚀刻[法]
15.Electrochemical Micromachining on Different Types of GaAs by Confined Etchant Layer Technique不同类型GaAs上应用约束刻蚀剂层技术进行电化学微加工
16.Device Processing: Etching. Surface passivation; dielectric films.元件制程:蚀刻,表面钝化,介电材料薄膜。
17.TFT-LCD's Thin'ning Technology and Reliability of ProductTFT-LCD面板化学蚀刻薄化研究及产品可靠性分析
18.I understand the circuits are etched into the wafer by repeating the photolithographic process of light exposure and chemical treatment.--我知道这些电路是通过照相平板印刷法的曝光和化学处理蚀刻到晶元上的。
相关短句/例句
electrochemical etching电化学蚀刻
1.The electrochemical etching system used for neutron energy measurement consists of variable power supply, step-up transformer, etching cell and heater.为了提高CR—39探测器的灵敏度,研制了电化学蚀刻系统。
3)Silicon photo-electrochemical etching硅光电化学刻蚀
4)photoelectrochemical etching光电化学刻蚀
5)chemistry etching化学蚀刻
1.In this paper, a generated method of 2-D binary phase grating by chemistry etching is presented.本文介绍用化学蚀刻的方法制作二维二元位相光栅。
6)chemical etching化学刻蚀
1.A simple chemical etching method was developed for fabricating the super-hydrophobic surface on polycrystalline aluminum alloy.采用简单化学刻蚀的方法制备出多晶铝合金基体上的超疏水表面。
2.By using effective chemical etching and scavenging system(HNO 3+NaOH) and the optimized experimental parameters, such as the etching time, etching current density, concentration of etchant or scavenger, the etched patterns were obtained, which is close to negative copy of the mold.运用约束刻蚀剂层技术 (CELT)在金属铜 (Cu)表面实现了三维微图形加工 ,取得成功的关键因素在于寻找到能对Cu进行有效CELT加工的化学刻蚀和捕捉体系。
3.In this work,the techniques of the electrochemical etching and the chemical etching have been developed for the titanium surface modification.发展电化学刻蚀和化学刻蚀技术,对钛表面进行处理,并应用扫描电镜、X射线衍射方法对其表面进行表征,探讨电化学刻蚀钛表面形成微观结构的机理。
延伸阅读
电化学刻蚀分子式:CAS号:性质:也称电解浸蚀。在一定的电解液中,采用电化学原理选择性地除去某种金属(或半导体)的过程。可外加电压(为电刷镀的逆过程)或不外加电压(化学刻蚀)。影响电化学蚀刻的因素有电场强度和频率、探测器厚度、蚀刻液浓度和径迹倾角等。化学刻蚀法使用较多,例如在印刷电路板的制作中,通过如下反应:Cu→Cu2++2e-(阳极) ;2Fe3++2e-→2Fe2+(阴极)。按预作保护的图样除去绝缘基板上的铜覆盖层。在微电子装置的制作中,对半导体(如硅)选择性地刻蚀是关键步骤。常用的刻蚀剂有CuCl2,FeCl3,H2CrO4,NH4Cl,H2O2-H2SO4等。