molybdenum disulfideMoS2
1.NH+4/molybdenum disulfide intercalated material was prepared by the exfoliation and restacking process.以剥层重堆法制备了NH+4/MoS2插层复合物,该复合物可以作为长期储存的单层MoS2,同时也可作为先驱体以便插入其它客体分子制成新的插层复合物。
2.Based on the exfoliation/restacking properties of LiMoS_2, several intercalation compounds of molybdenum disulfide with rich photic, electrical, magnetic, thermal and catalytical properties have been prepared.MoS2为层状结构固体,基于LiMoS2的可剥离/重堆性,人们制备出了一系列MoS2的夹层化合物,这类材料具有丰富的光、电、磁、热、催化等性能。
3)MoS 2MoS2
1.MoS 2 crystals were synthesized by a hydrothermal method from Na 2MoO 4 and CS(NH 2) 2 under 160～220 ℃ for 24 h.以硫脲为还原剂和硫源 ,利用水热法在 160～ 2 2 0℃下反应 ,合成了具有很好晶相的MoS2 。
2.MoS 2/MoSi 2 in situ composites are produced by combustion synthesis with mechanical activation and pre heating.采用活化燃烧合成法制备MoS2 /MoSi2 原位复合材料 ,用X -射线衍射仪 (XRD)对燃烧合成产物进行物相分析。
3.Ni-MoS 2 self-lubricating composties are produced by means of hot-pressed technology.用热压法生产Ni -MoS2 自润滑复合材料 ,研究了在微动摩擦条件下的室温和高温自润滑特性。
4)Ni MoS 2Ni-MoS2
5)MoS2 soft coatingMoS2软涂层
6)(Ni-Co-P)-MoS_2(Ni-Co-P)-MoS2
延伸阅读
E/D MOS电路 见增强型与耗尽型金属-氧化物-半导体集成电路。
