1)plasma etching等离子体刻蚀
1.Effects of plasma etching on Nafion~ membrane performances;等离子体刻蚀对Nafion~膜性能的影响
2.Application of Emission Spectrometry in Trace Fluorine Analysis of Flue Gas from Plasma Etching;发射光谱法在等离子体刻蚀废气微量F元素检测中的应用研究
3.Study of the ECR plasma etching process of PZT ferroelectric thin film materials;PZT铁电薄膜材料的ECR等离子体刻蚀研究
英文短句/例句
1.NUMERICAL STUDIES ON ETCH PROFILES IN HIGH-DENSITY PLASMA;高密度等离子体刻蚀轮廓的数值研究
2.Investigation of Etching SiCOH Films by Dual-Frequency Capacitively Coupled PlasmaSiCOH薄膜的双频等离子体刻蚀研究
3.Simulations of Plasma Etching Based on Diffusion Limited Erosion Model基于扩散限制刻蚀模型的等离子体刻蚀模拟研究
4.Inductive Couple Plasmas Etching Processing of InSb Wafer电感耦合等离子体刻蚀InSb芯片工艺的研究
5.Study of Inductively Coupled Plasma Etch of InP and Fabrication of 14xxnm Pump Laser Diodes;感应耦合等离子体刻蚀InP研究与14xxnm泵浦激光器制作
6.Therefore, plasma etching anisotropy can be improved by increasing rf frequency or rf-bias power.因此,等离子体刻蚀的各向异性可以通过增加射频频率和射频功率来改善。
7.plasma sputter combined etching等离子溅射复合刻蚀
8.Investigation of Inductively Coupled Fluorocarbon Plasma and Etching of SiO_2;碳氟感应耦合等离子体及其SiO_2介质刻蚀研究
9.The Study of the Etching Process with RF Cold Plasma at Atmospheric-pressure;常压射频冷等离子体在刻蚀工艺中的应用研究
10.planar plasma reactor平面式等离子体腐蚀器
11.radical plasma etching自由基等离子体腐蚀
12.Modeling and Simulation for Inductively Coupled Plasma Etching of Silicon in MEMS Fabrications;MEMS加工中电感耦合等离子体（ICP）刻蚀硅片的模型与模拟
13.Research on array carbon nanotubes film without substrate by centrifugal infiltration and plasma etching离心渗透等离子刻蚀法制备无基底阵列式碳纳米管复合膜
14.radial flow plasma etching reactor径向两等离子体腐蚀装置
15.parallel plate plasma etcher平行板等离子体腐蚀装置
16.Researches on Laser Ablation Induced Plasma Emission Spectra激光烧蚀诱导等离子体光谱实验研究
17.Plasma Performance for Laser Ablation of Boron-Potassium Nitrate激光烧蚀硼-硝酸钾的等离子体特性
18.Investigation on Characteristics of Ablation Plasma Induced by Intense Pulsed Ion Beam;强脉冲离子束产生的烧蚀等离子体特性的研究
相关短句/例句
plasma etch等离子体刻蚀
1.Silicon-micro-accelerometer is fabricated by plasma etch technology.采用等离子体刻蚀技术制作成硅微加速度计。
3)plasma etch等离子体蚀刻
1.Improve diffraction efficiency of relief holographic gratings by plasma etch;用等离子体蚀刻法提高浮雕全息光栅的衍射效率
2.The plasma etch theory on oxide and polysilicon in microelectronics manufacturing has been investigated.等离子体蚀刻硅深沟道用作存贮器件的储存电容有非常重要的作用,就等离子体在微电子制造领域中蚀刻二氧化硅,多晶硅的原理和如何控制形状(profile)和深沟道的深度做了研究,解释了HBr,NF3,He_30%O2气体,压力对蚀刻速率,Si/SiO2蚀刻选择比的影响。
4)Plasma Etching等离子刻蚀
1.Research on array carbon nanotubes film without substrate by centrifugal infiltration and plasma etching离心渗透等离子刻蚀法制备无基底阵列式碳纳米管复合膜
2.The methods for making carbon nanotubes(CNTs)/ polymer composite films by plasma etching are researched.本文研究了等离子刻蚀碳纳米管(CNTs)聚合物复合膜的工艺,并采用测量接触电阻表征薄膜的刻蚀效果。
5)plasma etching等离子蚀刻
1.At the present time,there are processes of punching,numerical control milling,chemical etching and plasma etching to open windows on the PI substrate.目前采用的在基材上开窗口的方法有机械冲切、数控铣、化学试剂蚀刻法和等离子蚀刻法等。
6)Plasma ion etching等子体刻蚀
延伸阅读
刻刻1.每时每刻。
