1)pulsed bias arc ion plating脉冲偏压电弧离子镀
1.Mechanical and optical properties of titanium dioxide films prepared by pulsed bias arc ion plating;脉冲偏压电弧离子镀TiO_2薄膜的力学与光学性能
2.Dielectric Films of TiO_2 and AlN by Pulsed Bias Arc Ion Plating;脉冲偏压电弧离子镀沉积TiO_2与AlN介电薄膜
3.Fundamentals of Pulsed Bias Arc Ion Plating;脉冲偏压电弧离子镀的工艺基础研究
英文短句/例句
1.Study of CrAlN Film Deposited by Pulsed Bias Arc Ion Plating;脉冲偏压电弧离子镀CrAlN薄膜性能研究
2.Fundamentals of Pulsed Bias Arc Ion Plating;脉冲偏压电弧离子镀的工艺基础研究
3.Dielectric Films of TiO_2 and AlN by Pulsed Bias Arc Ion Plating;脉冲偏压电弧离子镀沉积TiO_2与AlN介电薄膜
4.Superhard Multilayer Films Prepared by Pulsed Bias Arc Ion Plating;脉冲偏压电弧离子镀沉积超硬多层薄膜
5.Preparation and Characterization of Nanometer Hard Films by PBAIP;脉冲偏压电弧离子镀纳米硬膜的制备与表征
6. Study on Multi-Component （TiMe）N Hard Coatings Synthesized by Pulsed Bias Arc Ion Plating;脉冲偏压电弧离子镀（TiMe）N多元复合硬质薄膜研究
7.The Preparation Technology and Properties of CrN Coating Deposited by Superimposed Pusle Bias Cathodic Arc Ion Plating脉冲偏压电弧离子镀氮化铬涂层的制备技术及性能
8.COMPOSITION,MICROSTRUCTURE AND PROPERTIES OF C-N-Cr FILMS DEPOSITED BY PULSED BIAS ARC ION PLATING脉冲偏压电弧离子镀C-N-Cr薄膜的成分、结构与性能
9.Investigation on Plasma Load Characteristic and Pulsed Bias Power Supply of Arc Ion Plating电弧离子镀的等离子体负载特性与脉冲偏压电源研究
10.Effect of Pulsed Bias and Post-annealing on Structure and Performance of N-doped TiO_2 Films Deposited by Arc Ion Plating脉冲偏压及退火处理对电弧离子镀N掺杂TiO_2薄膜结构和性能的影响
11.The Arc Ion Plating Deposition of TiAlN Film Aided by Pulse N Ion Beam脉冲N离子束辅助电弧离子镀沉积TiAlN膜层的研究
12.Structure and mechanical properties of DLC films by pulsed vacuum arc ion deposition脉冲真空电弧离子镀沉积类金刚石薄膜的结构和力学性能研究
13.Electrochemical Corrosion Behaviours of Pulsed Bias MSIP Aluminum Coating on Depleted Uranium Surface铀表面脉冲偏压MSIP铝镀层的电化学腐蚀行为
14.Study on Microstructure and Properties of QTi2.5/Cu Films Prepared by Arc Ion Plating电弧离子镀QTi2.5/Cu镀层组织与性能分析
15.DIAGNOSTICS OF THE ARC PLASMA BY MONOWAVELENGTH PULSED LASER HOLOGRAPHIC INTERFEROMETRY电弧等离子体的单波长脉冲激光全息诊断
16.Research on Hydrodynamics Simulations of Radio-frequency and Pulse-Biased Plasma Sheaths;射频及脉冲偏压等离子体鞘层流体动力学模拟
17.Microstructures of NiCoCrAlY Coating Deposited by Arc Ion Plating-a Transmission Electron Microscopy Study电弧离子镀NiCoCrAlY涂层的透射电镜研究
18.The principle and construction of the AC arc.介绍了交流电弧离子镀的原理和结构。
相关短句/例句
pulse arc ion plate脉冲电弧离子镀
3)Pulsed vacuum arc ion deposition脉冲真空电弧离子镀
4)pulsed vacuum arc deposition脉冲真空电弧离子镀膜
1.It s very important to control the thickness of the film in the process of the pulsed vacuum arc deposition (PVAD). 在脉冲真空电弧离子镀膜过程中,膜层厚度的控制至关重要。
5)Pulse arc plasma deposition脉冲多弧离子镀
1.Diamond like carbon(DLC) films have been prepared on silicon by pulse arc plasma deposition.利用脉冲多弧离子镀技术在硅基底上沉积类金刚石薄膜。
6)arc ion plating电弧离子镀
1.Properties of TiAlCrN coating prepared by arc ion plating;电弧离子镀TiAlCrN多元涂层的性能研究
2.Effect of Ce on microstructure and properties of Ti-coatings deposited by arc ion plating;电弧离子镀(Ti,Ce)N涂层组织与性能研究
3.Microstructure and oxidation resistance of NiCrAlY coating deposited on Co-based high-temperature alloy by arc ion plating technology;钴基合金电弧离子镀NiCrAlY涂层的组织结构和抗氧化性能
延伸阅读
离子镀分子式：CAS号：性质：镀料和镀件置于真空室中，在一定真空度下从针形阀通入惰性气体(通常为氩气)，使真空度保持在0.1～1Pa。接通负高压，使蒸发源(镀料；阳极)和镀件(阴极)之间放电，建立低压气体放电的等离子区和阴极区。然后将蒸发源通电加热，使镀料金属气化进入等离子区。在高速电子轰击下，金属气体一部分被电离并在电场作用下被加速，射在镀件表面而形成镀层。离子镀的主要特点是镀层均匀，附着力好，可用于装饰、表面硬化、电子元器件用的金属或化合物镀层、光学用镀层等。
