1)N+ ion sputtering氮离子溅射
1.Objective To study the effect of N+ ion sputtering and N+ plasma ion implantation on the microorganisms adhesion to the surface of Co-Cr alloy.目的研究氮离子溅射和氮等离子浸没注入对钴铬合金表面微生物黏附附能力的影响。
2.Objective:To study the influence of N+ ion sputtering and N+ plasma ion implantation on clinically used Ti on adhesion of bacteria.目的:研究氮离子溅射和氮等离子浸没注入对纯钛表面细菌粘附能力的影响。
3.Objective To study the influence of N+ ion sputtering on clinically used titanium alloy on adhesion of bacteria.目的研究氮离子溅射对钛合金表面细菌黏附能力的影响。
英文短句/例句
1.Influence of N+ Ion Sputtering on Titanium Alloy on Adhesion of Bacteria氮离子溅射对钛合金表面细菌黏附的影响
2.Application of ion sputtering in plasma nitriding of austenitic stainless steel离子溅射在奥氏体不锈钢离子渗氮中的应用
3.diode sputter-ion pump二极管溅射离子泵[抽机]
4.in line sputterer直列式离子溅射装置
5.plasma sputter combined etching等离子溅射复合刻蚀
6.Studies on Series of High Valence Transitional Metal Nitride as Novel Anode Materials for Lithium-Ion Battery磁控溅射制备高价氮化物并用于锂离子电池电极材料的研究
7.Study on ion release of Ni from dental NiCr alloy by plasma magnetron reactive sputter deposition牙科用镍铬合金表面等离子磁控溅射氮化钛膜对镍离子析出的影响
8.THE SIMULATION RESEARCH ON ENERGY LOSS AND RANGE OF SPUTTERING IONS离子溅射能量损失及射程的模拟研究
9.Computer Simulation of the Transportation and the Sputtering of Ions in RF Magnetron Sputtering;射频磁控溅射镀膜过程中离子输运和溅射行为的模拟计算
10.low pressure triode method低压三极管离子溅射方法
11.Sandwich Type Distributed Sputtering Ion Pump with φb 6 mm Anode HolesΦ6毫米阳极孔层状分布式溅射离子泵
12.Research on Carbon Nitride Films Prepared by Ion Beam Sputtering;离子束溅射法制备C-N薄膜的研究
13.Growth of CuInSe_2 Films by Ion Beam Sputtering离子束溅射制备CuInSe_2薄膜的研究
14.Preparation of SiO_2 ion barrier film with RF magnetron sputtering射频磁控溅射制备SiO_2防离子反馈膜工艺探讨
15.Reflectance of Ir Layer in Vacuum Ultraviolet Wavelength Region Deposited by Ion Beam Sputtering离子束溅射沉积Ir膜真空紫外反射特性研究
16.Plasma emission spectra of ZnO and ZAO thin film grown by RF magnetron sputteringZnO和ZAO薄膜磁控溅射等离子体发射光谱
17.the emitting positions of the sputtered atoms are close to the corresponding incident ions (in the order of angstrom);溅射原子的出射位置就在离子入射位置的附近(埃数量级);
18.Ion sputtering yields on T? Ti target are numerically calculated with TRIM program.应用TRIM程序模拟了离子在氚钛靶上的溅射产额。
相关短句/例句
ion sputtering离子溅射
1.Application of ion sputtering in plasma nitriding of austenitic stainless steel离子溅射在奥氏体不锈钢离子渗氮中的应用
2.Effect of ion sputtering platinum on photocatalytic degradation of ethylene in the environment of cold storage离子溅射Pt对光催化降解冷藏环境中乙烯的影响
3.Silicate substrates were coated by ion sputtering with nickel,and then used to catalyze the decomposition of low hydrocarbons to prepare the relatively well distributed carbon nanotubes films(CNFs).1 实验部份1 1 镀膜与后处理采用离子溅射法在硅酸盐基板上镀镍,镀镍电流7 5mA,镀镍时间分别为2min、15min、30min、45min或60min;对镀镍基板再进行蚀刻(蚀刻电流7 5mA,蚀刻时间2min)或用氨水浸泡处理(含NH325%,超声振荡30min),然后烘干备用。
3)ion-beam sputtering离子束溅射
1.Si/Ge multilayer films were prepared by ion-beam sputtering.采用离子束溅射制备Si/Ge多层膜,通过X射线小角衍射计算其周期厚度及各子层的厚度,用Raman光谱对Si/Ge多层膜的微观结构及Si子层的结构进行表征。
2.Si/Ge multilayer films have been prepared by ion-beam sputtering on glass substrates with different periods.采用离子束溅射技术,在玻璃衬底上制备了不同周期数的Si/Ge多层膜样品。
3.A series of AgNiMnGa nano-granular films with different combinations of component materials were fabricated by using ion-beam sputtering technique.利用离子束溅射技术制备了AgNiMnGa颗粒膜的系列样品。
4)Ar ion sputtering effectAr离子溅射
5)ion-beam sputter离子束溅射
1.Polymer fluorocarbon films on polyester were prepared under various discharge conditions by ion-beam sputtering and characterized by using XPS.在不同放电条件下利用离子束溅射法制备了聚酯膜基底上的氟碳高分子膜 。
2.The LSCO films which on yttria-stabilized zirconia(YSZ) andaluminates lanthanum (LaAlO_3)were obtained by ion-beam sputtering method.本论文采用离子束溅射工艺在氧化钇稳定的氧化锆(YSZ)和铝酸镧(LaAlO_3)衬底上制备La_(0。
6)sputter ion pump溅射离子泵
1.Abstract: The structures and operating methods of turbo molecular pump with non-oil ultra high vacuum system and sputter ion pump with non-oil ultra high vacuum system are introduced, and their relevant characters are discussed.对涡轮分子泵无油超高真空系统及溅射离子泵无油超高真空系统的结构及操作方法作了介绍,并对它们相关的特性进行了讨论。
延伸阅读
溅射离子泵(scatteringionpump)溅射离子泵(scatteringionpump)溅射离子泵的结构如图。阳极为一薄壁不锈钢筒,阴极为两块薄钛板,分置阳极两方。阳极、阴极一同装于不锈钢外壳中,整个壳体装于一磁场中,磁力线方向平行于阳极筒轴向,磁通密度约1000~2000Gs,工作时极间电压为3~7kV产生潘宁放电,这是一种在很低压强下仍能自持的放电,所以能运用于高真空和超高真空。放电产生的离子轰击阴极时引起金属钛的溅射,溅射的钛沉积于阳极筒内壁及阴极上离子轰击较少的部位。不断地形成新鲜的活性钛膜,吸附气体分子。同时又连续地掩埋吸附于阳极筒内壁及阴极边角部位的气体分子(对惰性气体也有效),形成泵的抽气作用。真空度可达10-11Torr量级。