磁控反应溅射技术,plasma magnetron reactive sputter deposition technique英语短句,例句大全

磁控反应溅射技术,plasma magnetron reactive sputter deposition technique
1)plasma magnetron reactive sputter deposition technique磁控反应溅射技术
1.Objective To investigate the effect of a new engineering technique of vacuum deposition-plasma magnetron reactive sputter deposition technique on the metal-porcelain bond strength of a new type of Co-Cr ceramic and framework dental alloy.目的研究一种新的工程学真空镀膜技术——等离子磁控反应溅射技术对新型牙用烤瓷支架钴铬合金金瓷结合强度的影响。
2.Objective:To investigate the effect of TiN film deposited by plasma magnetron reactive sputter deposition technique on ion release of Ni from dental NiCr Alloy.方法:利用等离子磁控反应溅射技术在牙科用镍铬合金表面沉积TiN离子膜,以未溅射前为对照,浸泡于人工唾液中,通过电感偶合等离子体发射光谱-质谱连用仪(ICP-MS)定量检测Ni离子析出量。
2)direct current reactive magnetron sputtering直流反应磁控溅射技术
3)magnetron sputtering technique磁控溅射技术
1.Conclusion:Titanium film with nanoparticle sizes,which was formed by direct-current magnetron sputtering technique,can improve materials\' surface properties and enhance the biocompatibility.结论:利用直流磁控溅射技术在纯钛表面形成的纳米粒度的钛膜,可以改善钛表面的性能,提高其生物相容性。

英文短句/例句

1.HA/YSZ/PI Bioactive Composites Prepared by Magnetron Sputtering;磁控溅射技术制备HA/YSZ/PI生物复合材料
2.HA/YSZ/Ti6A14V Bioactive Gradient Composites Fabricated by Magnetron Sputtering;磁控溅射技术制备HA/YSZ/Ti6A14V生物梯度复合材料
3.The Thin Film Thermocouples Tempreture Testing System Based on Magnetron Sputtering Technology;基于磁控溅射技术的薄膜热电偶测温系统
4.Development of high-power pulse magnetron sputtering technology高功率脉冲磁控溅射技术的发展与研究
5.Studies to the Preparation and Characterization of SERS Active Substrates by Magnetron Sputtering;基于磁控溅射技术的表面增强拉曼散射（SERS）基底制备及其特性研究
6.MW-ECR Plasma Enhanced Unbalance Magnetron Sputtering and Carbon Nitride Films Preparation;微波-ECR等离子体增强非平衡磁控溅射技术及CN薄膜的制备研究
7.Design and Synthesis of ZrN/WN and CrN/ZrN Nanoscale Multilayered Coatings by Magnetron Sputtering Technique;磁控溅射技术设计合成ZrN/WN和CrN/ZrN纳米多层膜的研究
8.HAF/YSZ Gradient Composite Coatings Fabricated by Magnetron Sputtering on Ti6Al4V Substrate and the Characterization of Its Properties;磁控溅射技术制备Ti6Al4V基HAF/YSZ梯度复合涂层及其性能表征
9.Study of Medium-Frequency Magnetron Sputtering of Ni-AlN Solar Selective Absorbing Films;Ni-AlN太阳能选择性吸收涂层中频磁控溅射技术研究
10.Design and Synthesis of ZrAlN/ZrB_2 and W/ZrB_2 Nanoscale Multilayered Coatings by Magnetron Sputtering Techneque磁控溅射技术设计合成ZrAlN/ZrB_2和W/ZrB_2纳米多层膜的研究
11.The Study of Si-Based Thin Films Deposited by Magnetron Sputtering for Photovoltaic Cell基于磁控溅射技术沉积光伏电池用硅基薄膜材料的研究
12.Aluminum film was grown on modified fluorinated polymer composite films by rf magnetron sputtering.采用射频磁控溅射技术在改性氟塑料表面沉积铝层，制备了金属／氟化高聚物复合薄膜。
13.Study for Bearing in Magnetron Sputtering Deposition Technology and Mechanical Behavior of the Material;轴瓦磁控溅射镀膜技术及其材料力学性能研究
14.Research of the Vacuum Magnetron Sputtering Deposition Equipment and its Prdcess真空磁控溅射镀膜设备及工艺技术研究
15.Research of Preparation and Magnetic Properties of Magnetron Sputtered LSMO Films;LSMO薄膜磁控溅射制备及磁学性能研究
16.A New Type of the Magnetron Sputtering with a Magnet under the Substrate;基片下外加磁场磁控溅射方法的研究
17.Study on ZrW_2O_8 Films Prepared by Radio Frequency Magnetron Sputtering;射频磁控溅射法合成ZrW_2O_8薄膜的研究
18.Preparation of BN Films on Steels by Radio Frequency Magnetron Sputtering Method;钢基表面射频磁控溅射法制备BN薄膜

相关短句/例句

direct current reactive magnetron sputtering直流反应磁控溅射技术
3)magnetron sputtering technique磁控溅射技术
1.Conclusion:Titanium film with nanoparticle sizes,which was formed by direct-current magnetron sputtering technique,can improve materials\' surface properties and enhance the biocompatibility.结论:利用直流磁控溅射技术在纯钛表面形成的纳米粒度的钛膜,可以改善钛表面的性能,提高其生物相容性。
4)reactive magnetron sputtering磁控反应溅射
1.Modeling analysis of gradient-index coatings prepared by reactive magnetron sputtering;磁控反应溅射法制备渐变折射率薄膜的模型分析
2.TiO2 thin films were deposited on glass and quartz substrates, respectively, using the direct current reactive magnetron sputtering method.采用直流磁控反应溅射法,在玻璃和石英基体上制备了TiO2薄膜。
3.Si_3N_4 thin films were prepared on silicon substrate by RF reactive magnetron sputtering in Ar/N_2 atmosphere with highly pure Si disc as the target.利用射频磁控反应溅射法,以高纯S i为靶材,高纯N2气为反应气体,在S i衬底上制备出了S i3N4薄膜,研究了气体流量比对薄膜质量的影响。
5)magnetic reactive sputtering磁控反应溅射
1.Studied were the gas sensing properties of SnO2 thin film prepared by magnetic reactive sputtering.为研究SnO2薄膜的气敏特性,采用直流磁控反应溅射法制备了SnO2薄膜。
6)RF magnetron reactive sputtering磁控反应溅射
1.Hafnium oxide thin films are successfully prepared by RF magnetron reactive sputtering on p-type Si for high-k gate dielectric with hafnium as the target.采用射频磁控反应溅射法,以高纯Hf为靶材、高纯O2为反应气体,成功地在p型硅衬底上制备了高k栅介质HfO2薄膜,并对薄膜的沉积速率、成分和电学性能进行了研究。