根面抛光,Root surface air-polishing
1)Root surface air-polishing根面抛光
英文短句/例句

1.In Vitro and Clinical Evaluation of Subgingival Air-polishing龈下根面抛光对慢性牙周炎治疗影响的初步研究
2.polished dressing磨光,抛光,敷面打光,研磨
3.Precision mirror polishing. Ultra-flat surface polishing.精密镜面抛光,超平平面抛光.
4.When inspection indicates the surface to be filled, a rubbing compound may be used to obtain a high gloss.表面经过检验合格后,可用抛光剂抛光。
5.Experimental Investigation of Stressed Mirror Polishing on Paraboloid应力抛光技术加工抛物面的实验研究
6.A smooth, glossy finish or appearance; luster.抛光面,光泽一个光滑的有光泽的抛光木或表面;光泽
7.Machines force more polishing oils into the surface, for deeper gloss and reflections.在抛光盘表面可以加更多一些的抛光剂,可以进行深层的抛光处理。
8.Seat face Stellited, ground and lapped to a mirror finish.钨铬钴合金面阀座,经过研磨抛光达到镜面抛光度。
9.The polished side is fat glossy luster, the fracture is in dark luster.抛光面为油脂玻璃光泽,断口为油脂暗淡光泽。
10.The Study of Spiral Surface Belt Polishing Process Method and Special CNC Polishing Machine螺旋曲面砂带抛光工艺方法及专用数控抛光机研究
11.a parabolic reflector for light radiation.反射放射光线的抛物面反射器。
12.a power tool used to buff surfaces.用来抛光表面的能量工具。
13.All finished metal surfaces, such as chrome, aluminum, brass, stainless, etc.所有抛光金属表面,像铬合金、、铜、锈钢等。
14.Test methods for surface flatness of silicon polished slicesGB/T6621-1995硅抛光片表面平整度测试方法
15.parabolically graded optical fiber抛物线折射率剖面光纤维
16.Study on High Quality Surface Protection of Single Crystal MgO Polishing Substrate;单晶MgO抛光基片高质量表面保护研究
17.Design and Motion Simulation of Curved Surface Polishing Mechanism with Tri-Grinding-Head三磨头曲面抛光机构设计及运动仿真
18.Study on the Surface-State of GaAs Polished Wafer for the Use of LEDLED用砷化镓抛光片表面状态研究
相关短句/例句

double-sided polishing双面抛光
1.Based on the analysis of the process of double-sided polishing,we establish a mathematical model when the double-sided polishing machine working in a calm movement state,simulate the process of double-sided polishing by programming language as changing the parameters.分析了双面抛光机的加工过程,建立了抛光晶片在双面抛光机平稳运动状态下运动的数学模型,采用计算机对双面抛光加工进行运动仿真,并通过改变不同的参数值,得出抛光过程中不同参数对抛光效果的影响。
2.The wafer motion and the load in double-sided polishing process are main factors which affect the wafer surface quality.晶片在双面抛光加工过程中具有多向运动、受力复杂、表面材料微细去除的特征,晶片的运动和受力是影响双面抛光加工质量的主要因素。
3.According to the characteristics of core,clad and solid rim glass material of microchannel plate(MCP),the mechanism of double-sided polishing of MCP was analyzed.基于微通道板皮料、芯料、实体边玻璃材料的特点,分析了微通道板的双面抛光机理,研究了抛光工艺参数(抛光粉、抛光压力、抛光液pH值等)对MCP平面粗糙度、表面质量的影响,提出了微通道板的抛光工艺及参数:抛光粉应选择莫氏硬度为6、粒度为1。
3)double sided polishing双面抛光
1.Based on the kinematic analysis of the planet-double sided polishing process, the equation of relative velocity(the workpiece to the polishing plate) is established.文中通过行星轮式双面抛光的运动分析,得到工件相对于抛光盘的速度表达式;在Preston方程基础上,建立了材料去除函数和抛光均匀性函数;进行计算机仿真,讨论了不同转速比对抛光均匀性的影响;并通过加工实验验证了仿真与实验结果的一致性,为抛光加工工艺参数的确定提供理论依据。
2.The precise double sided polishing process is one of the main methods of getting the ultra-smooth surface for these materials.光电子信息产业的快速发展,要求蓝宝石、单晶硅等材料高效率、超光滑表面加工,精密双面抛光加工是得到这些材料超光滑表面的主要加工方法之一。
3.In this paper, the new way of double sided polishing processing technic of silicon wafer was designed, and polished process on the new double sided polishing machine.双面抛光已成为硅晶片的主要后续加工方法,但由于需要严格的加工条件,很难获得理想的超光滑表面。
4)Mirror finishing镜面抛光
1.Dimensional control in the process of electrolytic abrasive mirror finishing;电解镜面抛光中的尺寸控制
5)Cross section polishing截面抛光
6)double-side polishing双面抛光
1.Thus,the application range is widened,the work efficiency is raised by double-side lapping and double-side polishing,and the labour intensity is reduced.为了提高环形精磨、抛光机的应用效率,文章探讨了对环形精磨、抛光机进行改造,扩大其应用范围,达到双面精磨,双面抛光,可提工作效率,减轻劳动强度。
延伸阅读

抛光剂,抛光混合剂CAS:68909-13-7中文名称:焙烧提浓的氟碳铈镧矿;抛光剂,抛光混合剂英文名称:Bastnaesite, calcined concentrate;Calcined bastnasite;bastnaesite, calcined conc.;polishing compound;Bastnaesite,calcined concentrate