1)Bi_2Ti_2O_7介电薄膜
1.Bi_2Ti_2O_7 thin films have reletive high dielectric constant.Bi_2Ti_2O_7介电薄膜具有较高的介电常数,可用于制备新型绝缘栅场效应器件。
英文短句/例句
1.Preparation and Characterization of Low Dielectric Film Based on Polyphenylsilsesquioxane;PPSQ基低介电薄膜的制备及表征
2.Preparation and Property Improvement for CaCu_3Ti_4O_(12) Giant Dielectric Constant Thin FilmCaCu_3Ti_4O_（12）巨介电薄膜的制备与性能优化
3.Dielectric Films of TiO_2 and AlN by Pulsed Bias Arc Ion Plating;脉冲偏压电弧离子镀沉积TiO_2与AlN介电薄膜
4.film dielectric variable capacitor薄膜介质可变电容器
5.organic film capacitor有机薄膜介质电容器
6.Physical and Electrical Properties of ZrO_2 Gate Dielectrics Film高介电栅介质ZrO_2薄膜的物理电学性能
7.Research on the Fabrication of High-k Dielectric Films and the Discussion of Integrated Thin Film Capacitor;高k电介质薄膜制备研究与集成薄膜电容探讨
8.Studies on the Preparation and Dielectric Properties of BTO-based Ferroelectric Thin Film;BTO基铁电薄膜的制备与介电性能研究
9.Structure and Dielectric Characterization of Er_2O_3 Dielectric FilmEr_2O_3高介电常数薄膜的结构和介电性能的研究
10.PREPARATION AND DIELECTRIC PROPERTIES ANALYSIS OF HIGH DIELECTRIC Ta_2O_5 THIN FILMS高介电氧化钽薄膜制备与介电性能分析
11.High-K Ferroelectric Films and Multilayers Fabricated by Pulsed Laser Deposition;脉冲激光法制备高介电系数铁电薄膜和多层膜
12.film dielectric four-gang variable capacitor薄膜介质四连可变电容器
13.film super-small variable capacitor薄膜介质超小型可变电容器
14.Device Processing: Etching. Surface passivation; dielectric films.元件制程：蚀刻，表面钝化，介电材料薄膜。
15.Investigation of High Dielectric Ta_2O_5 Thin Films Deposited by Reactive Sputtering;反应溅射沉积高介电Ta_2O_5薄膜研究
16.The Dielectric Characteristic Research of Nano-Composite Polyimide Film;纳米复合聚酰亚胺薄膜的介电性研究
17.Investigation on preparation,Structure and dielectric properties of amorphous fluorinated carbon films;α-C：F薄膜的沉积、结构与介电性质研究
18.Preparation and Photoelectric Properties of TiO_2 Mesoporous Thin FilmsTiO_2介孔薄膜的制备及其光电性质研究
相关短句/例句
gray dielectric thin film灰介电薄膜
1.The concept of effective conductivity of gray dielectric thin film is introduced.用Boltzmann传输方程建立灰介电薄膜声子辐射传热方程,提出灰体介电薄膜的当量导热系数的概念,指出Fourier定律只适用于声学极厚区域,给出了用Fourier定律进行热流密度计算的误差。
3)thin dielectric film电介质薄膜
1.Size effect of the thermal conductivity across thin dielectric films;电介质薄膜导热系数的尺寸效应
2.Non equilibrium molecular dynamics (NEMD) simulations have been performed to explore the normal thermal conductivity of nanoscale thin dielectric films.通过非平衡分子动力学 (NEMD)模拟预报了纳米电介质薄膜的法向导热系数 。
4)dielectric film电介质薄膜
1.A new dielectric film-SiOP was grown on InGaAsP/InP multi-quantum wells (MQW) structure by plasma enhanced chemical vapor deposition (PECVD).用等离子体增强化学沉积(PECVD)方法制备了一种新的电介质薄膜—SiOP,用X射线光电子谱(XPS)和光荧光(PL)研究了膜的结构及膜对1。
5)high-k thin films高介电薄膜
6)thin film dielectric薄膜电介质
延伸阅读
钽基介电薄膜分子式：CAS号：性质：一种以氧化钽为主成分的介电薄膜。有纯氧化钽膜、掺杂钽基薄膜(掺氮、铝或硅)和钽基复合薄膜(如氧化钽-氧化硅膜、氧化钽-氧化铅膜等)三种。采用阳极氧化法、反应溅射法、等离子阳极氧化法等制取。氧化钽是一种优良的介电薄膜，介电常数为25。掺杂膜具有高的介电性能。复合膜具有高的阴极击穿电压。用于制作用在集成电路中的薄膜容器。
