磁过滤电弧离子镀,PBAIP英语短句,例句大全

磁过滤电弧离子镀,PBAIP
1)PBAIP磁过滤电弧离子镀

英文短句/例句

1.Fabrication of Ti-O Film by Vacuum Magnetic Filtered Arc Plasma Deposition and Its Blood Compatibility真空磁过滤电弧离子镀制备氧化钛薄膜及其血液相容性
2.Study on Arc Ion Plating with Magnetron of Same Basic Component for Both Deposited Layer and the Substrate (QTi2.5／Cu)QTi2.5/Cu同基合金磁控电弧离子镀研究
3.Study on Arc Ion Plating with Magnetron of Same Basic Component for Both Deposited Layer and the Substrate (H62/Cu和QAl9-4/Cu);H62/Cu和QAl9-4/Cu同基合金磁控电弧离子镀研究
4.Deposition Process in Cathodic Arc Ion Plating Through Computer Simulation;阴极电弧离子镀沉积过程的计算机模拟研究
5.Study on Microstructure and Properties of QTi2.5/Cu Films Prepared by Arc Ion Plating电弧离子镀QTi2.5/Cu镀层组织与性能分析
6.Microstructures of NiCoCrAlY Coating Deposited by Arc Ion Plating-a Transmission Electron Microscopy Study电弧离子镀NiCoCrAlY涂层的透射电镜研究
7.The principle and construction of the AC arc.介绍了交流电弧离子镀的原理和结构。
8.Study of CrSiN Film Deposited by Arc Ion Plating;电弧离子镀CrSiN薄膜基本性能的研究
9.Study of CrAlN Film Deposited by Pulsed Bias Arc Ion Plating;脉冲偏压电弧离子镀CrAlN薄膜性能研究
10.A Study on Preparation and Oxidation Resistance Property of CrAlTiN Film Deposited by Arc Ion Plating;电弧离子镀CrAlTiN膜的制备与性能研究
11.Fundamentals of Pulsed Bias Arc Ion Plating;脉冲偏压电弧离子镀的工艺基础研究
12.Process and Property of the ZrN Coating Made by Vacuum Arc Ion Plating真空电弧离子镀ZrN涂层的工艺与性能
13.Preparation and properties of CrN coating by arc ion deposition电弧离子镀CrN涂层的制备及性能研究
14.Preparation of Transparent (002) Preferential Orientation AlN Thin Film by Arc Ion Plating电弧离子镀制备透明(002)AlN薄膜
15.Research on electromagnetic compatibility of plasma arc welding process control system等离子弧焊过程控制系统的电磁兼容性研究
16.Effect of N~+ Ion Beam Bombardment on the Properties of Arc-Ion-Plated TIN Films氮离子束轰击对电弧离子镀TiN膜层的作用
17.Ti-O film was prepared by microwave-electron convolute resonance (MW-ECR) magnetron filter arc deposition process.采用微波电子回旋共振磁过滤弧设备制备钛氧薄膜。
18.The Study on the Metallic Bipolar Plates of Fuel Cell Modified by Films Deposited by AIP;燃料电池金属双极板电弧离子镀薄膜改性研究

相关短句/例句

Vacuum Magnetic Filtered Arc Plasma Deposition真空磁过滤电弧离子镀
1.Fabrication of Ti-O film by vacuum magnetic filtered arc plasma deposition and its blood compatibility真空磁过滤电弧离子镀沉积Ti-O薄膜及其血液相容性
2.In this paper, Ti-O films were prepared on various substrates by Vacuum Magnetic Filtered Arc Plasma Deposition (VMFAPD) at different oxygen partial pressure, substrate bias and deposition temperature.本文采用真空磁过滤电弧离子镀技术,通过改变氧分压、基体偏压、沉积温度等工艺参数在不同的基体上制备了Ti-O薄膜。
3)FAMIP过滤电弧离子镀
4)filtered cathode vacuum arc ion plating equipment过滤阴极真空电弧离子镀膜机
5)filtered cathode vacuum arc deposition过滤阴极真空电弧离子镀膜技术
6)filtered cathodic arc plasma磁过滤阴极弧等离子体
1.Titanium nitride coatings were deposited on unheated stainless steel substrate and stainless steel substrate heated to 400 ℃ by filtered cathodic arc plasma deposition (FCAP) and direct current magnetron sputtering deposition (DCSP), respectively.分别利用磁过滤阴极弧等离子体沉积装置和直流磁控溅射装置在不锈钢基底上制备了 Ti N涂层 ,采用 X射线光电子能谱仪、X射线衍射仪和扫描电子显微镜对涂层的结构及形貌进行了表征 ;利用纳米压痕仪测定了涂层的硬度 ;在 DF- PM型动摩擦系数精密测定仪上考察了涂层的摩擦学性能。
2.This thesis focused on the preparation of amorphous carbon nanotip arrays for excellent field emission cathode material by a unique combination of the anodic aluminum oxide (AAO) template and filtered cathodic arc plasma (FCAP) technology.本论文以磁过滤阴极弧等离子体技术结合阳极氧化铝模板制备冷阴极场发射材料非晶碳纳米尖点阵列膜为重点,分别对阳极氧化铝模板的制备工艺、模板孔径大小和孔道开口形状的准确控制及其性能进行了研究探讨,对非晶碳纳米尖点阵列的制备技术、性能进行了较为深入详细的分析探讨。