磁控溅射技术,magnetron sputtering technique
1)magnetron sputtering technique磁控溅射技术
1.Conclusion:Titanium film with nanoparticle sizes,which was formed by direct-current magnetron sputtering technique,can improve materials\' surface properties and enhance the biocompatibility.结论:利用直流磁控溅射技术在纯钛表面形成的纳米粒度的钛膜,可以改善钛表面的性能,提高其生物相容性。
英文短句/例句

1.HA/YSZ/PI Bioactive Composites Prepared by Magnetron Sputtering;磁控溅射技术制备HA/YSZ/PI生物复合材料
2.HA/YSZ/Ti6A14V Bioactive Gradient Composites Fabricated by Magnetron Sputtering;磁控溅射技术制备HA/YSZ/Ti6A14V生物梯度复合材料
3.The Thin Film Thermocouples Tempreture Testing System Based on Magnetron Sputtering Technology;基于磁控溅射技术的薄膜热电偶测温系统
4.Development of high-power pulse magnetron sputtering technology高功率脉冲磁控溅射技术的发展与研究
5.Studies to the Preparation and Characterization of SERS Active Substrates by Magnetron Sputtering;基于磁控溅射技术的表面增强拉曼散射(SERS)基底制备及其特性研究
6.MW-ECR Plasma Enhanced Unbalance Magnetron Sputtering and Carbon Nitride Films Preparation;微波-ECR等离子体增强非平衡磁控溅射技术及CN薄膜的制备研究
7.Design and Synthesis of ZrN/WN and CrN/ZrN Nanoscale Multilayered Coatings by Magnetron Sputtering Technique;磁控溅射技术设计合成ZrN/WN和CrN/ZrN纳米多层膜的研究
8.HAF/YSZ Gradient Composite Coatings Fabricated by Magnetron Sputtering on Ti6Al4V Substrate and the Characterization of Its Properties;磁控溅射技术制备Ti6Al4V基HAF/YSZ梯度复合涂层及其性能表征
9.Study of Medium-Frequency Magnetron Sputtering of Ni-AlN Solar Selective Absorbing Films;Ni-AlN太阳能选择性吸收涂层中频磁控溅射技术研究
10.Design and Synthesis of ZrAlN/ZrB_2 and W/ZrB_2 Nanoscale Multilayered Coatings by Magnetron Sputtering Techneque磁控溅射技术设计合成ZrAlN/ZrB_2和W/ZrB_2纳米多层膜的研究
11.The Study of Si-Based Thin Films Deposited by Magnetron Sputtering for Photovoltaic Cell基于磁控溅射技术沉积光伏电池用硅基薄膜材料的研究
12.Aluminum film was grown on modified fluorinated polymer composite films by rf magnetron sputtering.采用射频磁控溅射技术在改性氟塑料表面沉积铝层,制备了金属/氟化高聚物复合薄膜。
13.Study for Bearing in Magnetron Sputtering Deposition Technology and Mechanical Behavior of the Material;轴瓦磁控溅射镀膜技术及其材料力学性能研究
14.Research of the Vacuum Magnetron Sputtering Deposition Equipment and its Prdcess真空磁控溅射镀膜设备及工艺技术研究
15.Research of Preparation and Magnetic Properties of Magnetron Sputtered LSMO Films;LSMO薄膜磁控溅射制备及磁学性能研究
16.A New Type of the Magnetron Sputtering with a Magnet under the Substrate;基片下外加磁场磁控溅射方法的研究
17.Study on ZrW_2O_8 Films Prepared by Radio Frequency Magnetron Sputtering;射频磁控溅射法合成ZrW_2O_8薄膜的研究
18.Preparation of BN Films on Steels by Radio Frequency Magnetron Sputtering Method;钢基表面射频磁控溅射法制备BN薄膜
相关短句/例句

plasma magnetron reactive sputter deposition technique磁控反应溅射技术
1.Objective To investigate the effect of a new engineering technique of vacuum deposition-plasma magnetron reactive sputter deposition technique on the metal-porcelain bond strength of a new type of Co-Cr ceramic and framework dental alloy.目的研究一种新的工程学真空镀膜技术——等离子磁控反应溅射技术对新型牙用烤瓷支架钴铬合金金瓷结合强度的影响。
2.Objective:To investigate the effect of TiN film deposited by plasma magnetron reactive sputter deposition technique on ion release of Ni from dental NiCr Alloy.方法:利用等离子磁控反应溅射技术在牙科用镍铬合金表面沉积TiN离子膜,以未溅射前为对照,浸泡于人工唾液中,通过电感偶合等离子体发射光谱-质谱连用仪(ICP-MS)定量检测Ni离子析出量。
3)direct current reactive magnetron sputtering直流反应磁控溅射技术
4)magnetron sputtering & coating technique磁控溅射镀膜技术
1.The magnetron sputtering & coating technique has been widely used in the film preparation field,and the design of the control system has important influence on the stable operation of magnetron sputtering & coating equipment.磁控溅射镀膜技术在薄膜制备领域广泛应用,控制系统的设计对磁控溅射镀膜设备的稳定运行有着重要的影响。
5)magnetron sputtering磁控溅射
1.Preparation and characterization of anti-bacterial nonwovens by magnetron sputtering rare-earth activated TiO_2 onto PET fabric;磁控溅射制备稀土激活TiO_2复合抗菌非织造布
2.Effect of depositing process on microstructure chromium nitride coatings deposited by reactive magnetron sputtering;反应磁控溅射沉积工艺对Cr-N涂层微观结构的影响
3.Characterization study of Al magnetron sputtering coating on AZ31 magnesium alloy;AZ31镁合金磁控溅射镀铝膜的性能研究
6)RF magnetron sputtering磁控溅射
1.Investigation on organic light-emitting diodes with TiO_2 ultra-thin films as hole buffer layer by RF magnetron sputtering;磁控溅射法制备TiO_2空穴缓冲层的有机发光器件
2.ZrN films were synthesized by inductively coupled plasma(ICP)-assisted RF magnetron sputtering.利用电感耦合等离子体(ICP)辅助射频磁控溅射技术,在Si(111)片表面制备了ZrN薄膜。
3.The ZnO films were grown on quartz substrates by rf magnetron sputtering.本工作利用磁控溅射技术在石英衬底上生长出沿c轴择优取向的未掺杂ZnO薄膜,利用X射线衍射,光致发光,X射线光电子谱和Hall效应测量技术,研究了退火温度对结构、电学和光学性质的影响。
延伸阅读

磁控溅射分子式:CAS号:性质:用一个环形永久磁体在乎板形靶上产生环形磁场,在磁场作用下,电子被约束在一个环状空间内,形成高密度的等离子环。在等离子环内,电子不断地使Ar原子变成Ar离子,Ar离子被加速后打向靶表面,把靶内的原子溅射出来,沉积在基片上形成薄膜。若靶材为导体,溅射电源可用直流或射频电源,如靶材是绝缘体,则必须用射频电源。用多源共溅射加后处理法可制备双面薄膜。将基片放置在靶中心线上,称为正轴溅射,基片放在靶轴线外;称为偏轴溅射。磁控溅射是广泛采用的制膜方法。