1)R.F.sputteringR.F.磁控溅射
2)magnetron sputtering磁控溅射
1.Preparation and characterization of anti-bacterial nonwovens by magnetron sputtering rare-earth activated TiO_2 onto PET fabric;磁控溅射制备稀土激活TiO_2复合抗菌非织造布
2.Effect of depositing process on microstructure chromium nitride coatings deposited by reactive magnetron sputtering;反应磁控溅射沉积工艺对Cr-N涂层微观结构的影响
3.Characterization study of Al magnetron sputtering coating on AZ31 magnesium alloy;AZ31镁合金磁控溅射镀铝膜的性能研究
英文短句/例句
1.Research of Preparation and Magnetic Properties of Magnetron Sputtered LSMO Films;LSMO薄膜磁控溅射制备及磁学性能研究
2.A New Type of the Magnetron Sputtering with a Magnet under the Substrate;基片下外加磁场磁控溅射方法的研究
3.Study on ZrW_2O_8 Films Prepared by Radio Frequency Magnetron Sputtering;射频磁控溅射法合成ZrW_2O_8薄膜的研究
4.Preparation of BN Films on Steels by Radio Frequency Magnetron Sputtering Method;钢基表面射频磁控溅射法制备BN薄膜
5.Computer Simulation of Thin Film Deposition by RF Magnetron Sputtering;射频磁控溅射沉积薄膜的计算机模拟
6.Effects of Post-Deposition Annealing on ZrW_2O_8 Thin Films by Radio Frequency Magnetron Sputtering射频磁控溅射ZrW_2O_8薄膜的高温退火研究
7.Investigation on Nanocrystalline Fe-N Thin Films Grown by Direct Current Magnetron Sputtering;直流磁控溅射纳米晶Fe-N薄膜的研究
8.Study of Magnetron Sputtring TiN Film Uesed on Nickel Intaglio Plate;镍凹版表面磁控溅射TiN膜层性能研究
9.Nano-β-FeSi_2/a-Si Layered Construction Prepared by Magnetron Sputtering;磁控溅射法合成纳米β-FeSi_2/a-Si多层结构
10.The Research on TiN Films Deposited by Magnetron Sputtering;反应磁控溅射法制备TiN薄膜的研究
11.The Preparation of PZT Ferroelectric Thin Films by Magnetron Sputtering Method at Low Temperature;PZT铁电薄膜的磁控溅射低温生长
12.Research on Preparation and Properties of Magnetron Sputtering Sb-ZnO Thin Film;磁控溅射制备Sb-ZnO薄膜及其性能研究
13.Study on Properties of TiN and ZrN Films Deposited by Magnetron Sputtering;磁控溅射TiN及ZrN薄膜的特性研究
14.Preparation and Characters of TiAlN Thin Films by Magnetron Sputtering;磁控溅射制备TiAlN薄膜及性能分析
15.PIC/MCC Simulation of Planar DC Magnetron Sputtering;PIC/MCC模拟直流平面磁控溅射
16.Deposition of p Type ZnMgO Thin Films by DC Reactive Magnetron Sputtering;直流反应磁控溅射法制备p型ZnMgO薄膜
17.Preparation of P-type Cu_2O Thin Films by DC Magnetron Sputtering;磁控溅射法制备P型Cu_2O薄膜
18.Structure Characterization and Properties of Cu-Fe Thin Films Prepared by Magnetron Sputtering;磁控溅射Cu-Fe薄膜的结构表征与性能
相关短句/例句
magnetron sputtering磁控溅射
1.Preparation and characterization of anti-bacterial nonwovens by magnetron sputtering rare-earth activated TiO_2 onto PET fabric;磁控溅射制备稀土激活TiO_2复合抗菌非织造布
2.Effect of depositing process on microstructure chromium nitride coatings deposited by reactive magnetron sputtering;反应磁控溅射沉积工艺对Cr-N涂层微观结构的影响
3.Characterization study of Al magnetron sputtering coating on AZ31 magnesium alloy;AZ31镁合金磁控溅射镀铝膜的性能研究
3)RF magnetron sputtering磁控溅射
1.Investigation on organic light-emitting diodes with TiO_2 ultra-thin films as hole buffer layer by RF magnetron sputtering;磁控溅射法制备TiO_2空穴缓冲层的有机发光器件
2.ZrN films were synthesized by inductively coupled plasma(ICP)-assisted RF magnetron sputtering.利用电感耦合等离子体(ICP)辅助射频磁控溅射技术,在Si(111)片表面制备了ZrN薄膜。
3.The ZnO films were grown on quartz substrates by rf magnetron sputtering.本工作利用磁控溅射技术在石英衬底上生长出沿c轴择优取向的未掺杂ZnO薄膜,利用X射线衍射,光致发光,X射线光电子谱和Hall效应测量技术,研究了退火温度对结构、电学和光学性质的影响。
4)magnetic sputtering磁控溅射
1.Power supply feedback control of industrial giant target during magnetic sputtering;工业用巨型磁控溅射靶电源反馈控制的研究
2.Preparation and analysis of In_2O_3-SnO_2 thin films deposited by magnetic sputtering;磁控溅射制备In_2O_3-SnO_2薄膜与分析
3.The fabrication of plane thin-film H_2S gas sensor with magnetic sputtering method;利用磁控溅射仪制作平面薄膜型H_2S硅微传感器
5)Sputtering[英]['sp?t?][美]['sp?t?]磁控溅射
1.Experiment on Sputtering Metal Thin Film on Wood Surface;木材磁控溅射镀膜金属试验
2.Magnetic controlled sputtering were used to produce amorphous SmFe film,and with further annealing,nanocrytalline particles diffused in Cu base are obtained.本文采用磁控溅射方法得到非晶SmFe薄膜 ,通过时效处理后 ,得到均匀分布在铜基体上的磁性纳米颗粒。
3.Thin films of TiN were deposited on float glass substrates by DC reactive magnetron sputtering.用直流反应磁控溅射法在浮法玻璃基片上制备了TiN薄膜。
6)magnetron sputter磁控溅射
1.Engineering applications of microarc oxidation and magnetron sputtering;微弧氧化与磁控溅射的工程应用
2.Miedema theory was used to design homogeneous mixed alloy ingredient, and magnetron sputtering was used to prepare the alloy.依据Miedema理论设计合金均值混合成分,采用磁控溅射法制备合金。
3.09 alloy film was made by magnetron sputter.l合全膜的制备方法利用430H磁控溅射仪制备合金膜。
延伸阅读
[3-(aminosulfonyl)-4-chloro-N-(2.3-dihydro-2-methyl-1H-indol-1-yl)benzamide]分子式:C16H16ClN3O3S分子量:365.5CAS号:26807-65-8性质:暂无制备方法:暂无用途:用于轻、中度原发性高血压。